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Growth of Tunnels during Aluminum DC Pulse Current Etching
High-purity aluminum foil was etched with DC pulse current in acids solutions at first time. Experiments indicated that tunnels morphology was influenced by current density, pulse duty-cycle and frequency of DC pulse current, tunnels began to grow when the current density reached to 0.8A cm-2, and tunnels grew along three directions to form a netlike construction in the surface of aluminum foil, which increased effectually surface areas of aluminum foil. In addition, when aluminum was etched in the solution of 1 N HCl +0.8 N HNO3,tunnels morphology shows that tunnel does not grow continually during DC pulse current etching, so it is a method to study the mechanism of tunnel growth, for example period of tunnel growth, velocity of tunnel growth. The experimental results are discussed according to tunnels morphology.
Growth of Tunnels during Aluminum DC Pulse Current Etching
High-purity aluminum foil was etched with DC pulse current in acids solutions at first time. Experiments indicated that tunnels morphology was influenced by current density, pulse duty-cycle and frequency of DC pulse current, tunnels began to grow when the current density reached to 0.8A cm-2, and tunnels grew along three directions to form a netlike construction in the surface of aluminum foil, which increased effectually surface areas of aluminum foil. In addition, when aluminum was etched in the solution of 1 N HCl +0.8 N HNO3,tunnels morphology shows that tunnel does not grow continually during DC pulse current etching, so it is a method to study the mechanism of tunnel growth, for example period of tunnel growth, velocity of tunnel growth. The experimental results are discussed according to tunnels morphology.
Growth of Tunnels during Aluminum DC Pulse Current Etching
Applied Mechanics and Materials ; 654 ; 24-30
2014-10-01
7 pages
Article (Journal)
Electronic Resource
English
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