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Monitoring Polymeric Fouling in a Continuous Reactor by Electrochemical Impedance Spectroscopy
Monitoring early stages of polymeric deposit formation and its prevention were studied by in‐situ electrochemical impedance spectroscopy (EIS) in a continuously operating reactor employed for polymer production. An EIS flow cell was designed and employed during the emulsion polymerization of vinyl acetate. The electrochemical analysis of the complex impedance at the solution/reactor interface allows the time‐resolved detection of film formation processes. In comparison to oxide‐covered stainless steel, an anti‐adhesive sol‐gel coated alloy showed a significant inhibition of poly(vinyl acetate) fouling. The EIS‐based approach proved to be a valuable tool for monitoring both thin barrier film performance and fouling processes under harsh process conditions.
Monitoring Polymeric Fouling in a Continuous Reactor by Electrochemical Impedance Spectroscopy
Monitoring early stages of polymeric deposit formation and its prevention were studied by in‐situ electrochemical impedance spectroscopy (EIS) in a continuously operating reactor employed for polymer production. An EIS flow cell was designed and employed during the emulsion polymerization of vinyl acetate. The electrochemical analysis of the complex impedance at the solution/reactor interface allows the time‐resolved detection of film formation processes. In comparison to oxide‐covered stainless steel, an anti‐adhesive sol‐gel coated alloy showed a significant inhibition of poly(vinyl acetate) fouling. The EIS‐based approach proved to be a valuable tool for monitoring both thin barrier film performance and fouling processes under harsh process conditions.
Monitoring Polymeric Fouling in a Continuous Reactor by Electrochemical Impedance Spectroscopy
Neßlinger, Vanessa (author) / Rust, Sören (author) / Atlanov, Jan (author) / Pauer, Werner (author) / Grundmeier, Guido (author)
Chemie Ingenieur Technik ; 96 ; 291-299
2024-03-01
9 pages
Article (Journal)
Electronic Resource
English
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