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The Kinetics of Oxygen Loss and Thermal Donor Formation in Silicon at Temperatures between 350C and 500C
The Kinetics of Oxygen Loss and Thermal Donor Formation in Silicon at Temperatures between 350C and 500C
The Kinetics of Oxygen Loss and Thermal Donor Formation in Silicon at Temperatures between 350C and 500C
McQuaid, S. A. (Autor:in) / Londos, C. A. (Autor:in) / Binns, M. J. (Autor:in) / Newman, R. C. (Autor:in)
MATERIALS SCIENCE FORUM ; 963
01.01.1994
963 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
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