Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Characteristics of titanium oxide films deposited by an activated reactive evaporation method
Characteristics of titanium oxide films deposited by an activated reactive evaporation method
Characteristics of titanium oxide films deposited by an activated reactive evaporation method
Fujii, T. (Autor:in) / Sakata, N. (Autor:in) / Takada, J. (Autor:in) / Miura, Y. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 9 ; 1468
01.01.1994
1468 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Hexagonal GaN films deposited by reactive hot wall evaporation technique
British Library Online Contents | 2002
|British Library Online Contents | 2006
|Zirconium oxide films deposited by reactive pulsed laser ablation
British Library Online Contents | 1999
|Oxygen gettering effect during the reactive evaporation of manganese oxide films
British Library Online Contents | 1999
|Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process
British Library Online Contents | 2007
|