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Chlorine adsorption on electron beam irradiated GaAs photo-oxides: mechanism of in situ EB lithography
Chlorine adsorption on electron beam irradiated GaAs photo-oxides: mechanism of in situ EB lithography
Chlorine adsorption on electron beam irradiated GaAs photo-oxides: mechanism of in situ EB lithography
Ide, Y. (Autor:in) / Yamada, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 82/83 ; 310
01.01.1994
310 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
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