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    Chlorine adsorption on electron beam irradiated GaAs photo-oxides: mechanism of in situ EB lithography

    New search for: Ide, Y.
    New search for: Yamada, M.

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    Chlorine adsorption on electron beam irradiated GaAs photo-oxides: mechanism of in situ EB lithography

    New search for: Ide, Y.
    New search for: Yamada, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Chlorine adsorption on electron beam irradiated GaAs photo-oxides: mechanism of in situ EB lithography

    New search for: Ide, Y.
    New search for: Yamada, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Chlorine adsorption on electron beam irradiated GaAs photo-oxides: mechanism of in situ EB lithography

    Contributors:

    Ide, Y. (author) / Yamada, M. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 82/83 ; 310

    Publication date:

    1994-01-01

    Size:

    310 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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