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Si~1~-~xGe~x thin films deposited by the pulsed excimer laser ablation technique
Si~1~-~xGe~x thin films deposited by the pulsed excimer laser ablation technique
Si~1~-~xGe~x thin films deposited by the pulsed excimer laser ablation technique
Antoni, F. (Autor:in) / Fogarassy, E. (Autor:in) / Fuchs, C. (Autor:in) / Prevot, B. (Autor:in) / Dieleman, J. / Biermann, U. K. P. / Hess, P.
01.01.1995
175 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
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