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    Si~1~-~xGe~x thin films deposited by the pulsed excimer laser ablation technique

    New search for: Antoni, F.
    New search for: Fogarassy, E.
    New search for: Fuchs, C.
    New search for: Prevot, B.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

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    Si~1~-~xGe~x thin films deposited by the pulsed excimer laser ablation technique

    New search for: Antoni, F.
    New search for: Fogarassy, E.
    New search for: Fuchs, C.
    New search for: Prevot, B.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Si~1~-~xGe~x thin films deposited by the pulsed excimer laser ablation technique

    New search for: Antoni, F.
    New search for: Fogarassy, E.
    New search for: Fuchs, C.
    New search for: Prevot, B.
    New search for: Dieleman, J.
    New search for: Biermann, U. K. P.
    New search for: Hess, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Si~1~-~xGe~x thin films deposited by the pulsed excimer laser ablation technique

    Contributors:

    Antoni, F. (author) / Fogarassy, E. (author) / Fuchs, C. (author) / Prevot, B. (author) / Dieleman, J. / Biermann, U. K. P. / Hess, P.

    Published in:

    Photon-Assisted Processing of Surfaces and Thin Films ; 175

    APPLIED SURFACE SCIENCE ; 86

    Publication date:

    1995-01-01

    Size:

    175 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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