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Effects of substrate cleaning and film thickness on the epitaxial growth of ultrahigh vacuum deposited Cu thin films on (001)Si
Effects of substrate cleaning and film thickness on the epitaxial growth of ultrahigh vacuum deposited Cu thin films on (001)Si
Effects of substrate cleaning and film thickness on the epitaxial growth of ultrahigh vacuum deposited Cu thin films on (001)Si
Liu, C. S. (Autor:in) / Chen, L. J. (Autor:in)
APPLIED SURFACE SCIENCE ; 92 ; 84-88
01.01.1996
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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