Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
Antoni, F. (Autor:in) / Fuchs, C. (Autor:in) / Fogarassy, E. (Autor:in)
APPLIED SURFACE SCIENCE ; 96/98 ; 50-54
01.01.1996
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Silicon and silicon-germanium nanoparticles obtained by Pulsed Laser Deposition
British Library Online Contents | 2019
|Silicon and silicon-germanium nanoparticles obtained by Pulsed Laser Deposition
British Library Online Contents | 2019
|British Library Online Contents | 2013
|SnO2 nanostructured films obtained by pulsed laser ablation deposition
British Library Online Contents | 2005
|Conductivity of a disordered ferromagnetic monoatomic film
British Library Online Contents | 2008
|