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Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
Antoni, F. (author) / Fuchs, C. (author) / Fogarassy, E. (author)
APPLIED SURFACE SCIENCE ; 96/98 ; 50-54
1996-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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