Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Characteristics of titanium nitride films grown by pulsed laser deposition
Characteristics of titanium nitride films grown by pulsed laser deposition
Characteristics of titanium nitride films grown by pulsed laser deposition
Chowdhury, R. (Autor:in) / Vispute, R. D. (Autor:in) / Jagannadham, K. (Autor:in) / Narayan, J. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 11 ; 1458-1469
01.01.1996
12 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Pulsed laser deposition of titanium nitride films on sapphire
British Library Online Contents | 1999
|Aluminum nitride thin films grown by plasma-assisted pulsed laser deposition
British Library Online Contents | 1997
|Thickness distribution of carbon nitride films grown by inverse-pulsed laser deposition
British Library Online Contents | 2005
|Tungsten nitride films grown via pulsed laser deposition studied in situ by electron spectroscopies
British Library Online Contents | 2003
|Pulsed laser deposition of aluminum nitride and gallium nitride thin films
British Library Online Contents | 1998
|