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Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient
Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient
Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient
Wolczynski, W. (Autor:in) / Billia, B. (Autor:in) / Rabczak, K. (Autor:in) / Roosz, A. / Rettenmayr, M.
01.01.1996
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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