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    Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient

    New search for: Wolczynski, W.
    New search for: Billia, B.
    New search for: Rabczak, K.
    New search for: Roosz, A.
    New search for: Rettenmayr, M.

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    Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient

    New search for: Wolczynski, W.
    New search for: Billia, B.
    New search for: Rabczak, K.
    New search for: Roosz, A.
    New search for: Rettenmayr, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient

    New search for: Wolczynski, W.
    New search for: Billia, B.
    New search for: Rabczak, K.
    New search for: Roosz, A.
    New search for: Rettenmayr, M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Interlamellar Spacing in Al-Si Eutectic Growth Controlled by Temperature Gradient

    Contributors:

    Wolczynski, W. (author) / Billia, B. (author) / Rabczak, K. (author) / Roosz, A. / Rettenmayr, M.

    Published in:

    Solidification and Gravity ; 323-330

    MATERIALS SCIENCE FORUM

    Publication date:

    1996-01-01

    Size:

    8 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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