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Ultrahigh vacuum system for atomic-scale planarization of 6 inch Si(001) substrate
Ultrahigh vacuum system for atomic-scale planarization of 6 inch Si(001) substrate
Ultrahigh vacuum system for atomic-scale planarization of 6 inch Si(001) substrate
Idota, K. (Autor:in) / Niwa, M. (Autor:in) / Sumita, I. (Autor:in)
APPLIED SURFACE SCIENCE ; 99 ; 311-315
01.01.1996
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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Ultrahigh vacuum system for atomic-scale planarization of 6 inch Si(001) substrate
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