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Demonstration of a Nanolithographic Technique Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium
Demonstration of a Nanolithographic Technique Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium
Demonstration of a Nanolithographic Technique Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium
Berggren, K. K. (Autor:in) / Younkin, R. (Autor:in) / Cheung, E. (Autor:in) / Prentiss, M. (Autor:in) / Black, A. J. (Autor:in) / Whitesides, G. M. (Autor:in) / Ralph, D. C. (Autor:in) / Black, C. T. (Autor:in) / Tinkham, M. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH- ; 9 ; 52-55
01.01.1997
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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