Demonstration of a Nanolithographic Technique Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium: Fid-Bau Portal

Demonstration of a Nanolithographic Technique Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium

Berggren, K. K. / Younkin, R. / Cheung, E. / Prentiss, M. / Black, A. J. / Whitesides, G. M. / Ralph, D. C. / Black, C. T. / Tinkham, M.

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Demonstration of a Nanolithographic Technique Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium

Berggren, K. K. / Younkin, R. / Cheung, E. / Prentiss, M. / Black, A. J. / Whitesides, G. M. / Ralph, D. C. / Black, C. T. / Tinkham, M.

Demonstration of a Nanolithographic Technique Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium

Berggren, K. K. / Younkin, R. / Cheung, E. / Prentiss, M. / Black, A. J. / Whitesides, G. M. / Ralph, D. C. / Black, C. T. / Tinkham, M.

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Document information

Title:

Demonstration of a Nanolithographic Technique Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium

Contributors:

Berggren, K. K. (author) / Younkin, R. (author) / Cheung, E. (author) / Prentiss, M. (author) / Black, A. J. (author) / Whitesides, G. M. (author) / Ralph, D. C. (author) / Black, C. T. (author) / Tinkham, M. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH- ; 9 ; 52-55

Publication date:

1997-01-01

Size:

4 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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