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Formation mechanism of ultrathin WSiN barrier layer in a W/WN~x/Si system
Formation mechanism of ultrathin WSiN barrier layer in a W/WN~x/Si system
Formation mechanism of ultrathin WSiN barrier layer in a W/WN~x/Si system
Nakajima, K. (Autor:in) / Akasaka, Y. (Autor:in) / Miyano, K. (Autor:in) / Takahashi, M. (Autor:in) / Suehiro, S. (Autor:in) / Suguro, K. (Autor:in)
APPLIED SURFACE SCIENCE ; 117/118 ; 312-316
01.01.1997
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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