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Photoreflectance characterisation of Ar^+ ion etched and SiCl~4 reactive ion etched silicon (100)
Photoreflectance characterisation of Ar^+ ion etched and SiCl~4 reactive ion etched silicon (100)
Photoreflectance characterisation of Ar^+ ion etched and SiCl~4 reactive ion etched silicon (100)
Murtagh, M. (Autor:in) / Lynch, S. M. (Autor:in) / Kelly, P. V. (Autor:in) / Hildebrandt, S. (Autor:in) / Herbert, P. A. F. (Autor:in) / Jeynes, C. (Autor:in) / Crean, G. M. (Autor:in)
MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 13 ; 961-964
01.01.1997
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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