Photoreflectance characterisation of Ar^+ ion etched and SiCl~4 reactive ion etched silicon (100): Fid-Bau Portal

Photoreflectance characterisation of Ar^+ ion etched and SiCl~4 reactive ion etched silicon (100)

Murtagh, M. / Lynch, S. M. / Kelly, P. V. / Hildebrandt, S. / Herbert, P. A. F. / Jeynes, C. / Crean, G. M.

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Photoreflectance characterisation of Ar^+ ion etched and SiCl~4 reactive ion etched silicon (100)

Murtagh, M. / Lynch, S. M. / Kelly, P. V. / Hildebrandt, S. / Herbert, P. A. F. / Jeynes, C. / Crean, G. M.

Photoreflectance characterisation of Ar^+ ion etched and SiCl~4 reactive ion etched silicon (100)

Murtagh, M. / Lynch, S. M. / Kelly, P. V. / Hildebrandt, S. / Herbert, P. A. F. / Jeynes, C. / Crean, G. M.

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Title:

Photoreflectance characterisation of Ar^+ ion etched and SiCl~4 reactive ion etched silicon (100)

Contributors:

Murtagh, M. (author) / Lynch, S. M. (author) / Kelly, P. V. (author) / Hildebrandt, S. (author) / Herbert, P. A. F. (author) / Jeynes, C. (author) / Crean, G. M. (author)

Published in:

MATERIALS SCIENCE AND TECHNOLOGY -LONDON- ; 13 ; 961-964

Publication date:

1997-01-01

Size:

4 pages

ISSN:

0267-0836

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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