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AFM Study of In Situ Etching of 4H and 6H SiC Substrates
AFM Study of In Situ Etching of 4H and 6H SiC Substrates
AFM Study of In Situ Etching of 4H and 6H SiC Substrates
Karlsson, S. (Autor:in) / Nordell, N. (Autor:in) / Pensl, G. / Morkoc, H. / Monemar, B. / Janzen, E.
01.01.1998
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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