Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
X-Band ENDOR of Boron and Beryllium Acceptors in Silicon Carbide
X-Band ENDOR of Boron and Beryllium Acceptors in Silicon Carbide
X-Band ENDOR of Boron and Beryllium Acceptors in Silicon Carbide
Hofstaetter, A. (Autor:in) / Meyer, B. K. (Autor:in) / Scharmann, A. (Autor:in) / Baranov, P. G. (Autor:in) / Ilyin, I. V. (Autor:in) / Mokhov, E. N. (Autor:in) / Pensl, G. / Morkoc, H. / Monemar, B. / Janzen, E.
01.01.1998
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
EPR and ENDOR of Defects in Silicon Carbide
British Library Online Contents | 1997
|Donors and Acceptors in SiC - Studies with EPR and ENDOR
British Library Online Contents | 2000
|Electronic Structure of Acceptors in Silicon Carbide
British Library Online Contents | 1998
|Beryllium Implantation Doping of Silicon Carbide
British Library Online Contents | 2000
|Oxygen in silicon carbide: shallow donors and deep acceptors
British Library Online Contents | 1999
|