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Developing novel photoresists: microstructuring of triazene containing copolyester films
Developing novel photoresists: microstructuring of triazene containing copolyester films
Developing novel photoresists: microstructuring of triazene containing copolyester films
Hahn, Ch. (Autor:in) / Kunz, Th. (Autor:in) / Dahn, U. (Autor:in) / Nuyken, O. (Autor:in) / Wokaun, A. (Autor:in)
APPLIED SURFACE SCIENCE ; 127-129 ; 899-904
01.01.1998
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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