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Developing novel photoresists: microstructuring of triazene containing copolyester films

Hahn, Ch. / Kunz, Th. / Dahn, U. / Nuyken, O. / Wokaun, A.

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Developing novel photoresists: microstructuring of triazene containing copolyester films

Hahn, Ch. / Kunz, Th. / Dahn, U. / Nuyken, O. / Wokaun, A.

Developing novel photoresists: microstructuring of triazene containing copolyester films

Hahn, Ch. / Kunz, Th. / Dahn, U. / Nuyken, O. / Wokaun, A.

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Order at Subito €

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Document information

Title:

Developing novel photoresists: microstructuring of triazene containing copolyester films

Contributors:

Hahn, Ch. (author) / Kunz, Th. (author) / Dahn, U. (author) / Nuyken, O. (author) / Wokaun, A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 127-129 ; 899-904

Publication date:

1998-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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