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Growth and characterization of Ge nanocrystals in ultrathin SiO~2 films
Growth and characterization of Ge nanocrystals in ultrathin SiO~2 films
Growth and characterization of Ge nanocrystals in ultrathin SiO~2 films
Fukuda, H. (Autor:in) / Kobayashi, T. (Autor:in) / Endoh, T. (Autor:in) / Nomura, S. (Autor:in) / Sakai, A. (Autor:in) / Ueda, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 130-132 ; 776-780
01.01.1998
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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