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    Growth and characterization of Ge nanocrystals in ultrathin SiO~2 films

    New search for: Fukuda, H.
    New search for: Kobayashi, T.
    New search for: Endoh, T.
    New search for: Nomura, S.
    New search for: Sakai, A.
    New search for: Ueda, Y.

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    Growth and characterization of Ge nanocrystals in ultrathin SiO~2 films

    New search for: Fukuda, H.
    New search for: Kobayashi, T.
    New search for: Endoh, T.
    New search for: Nomura, S.
    New search for: Sakai, A.
    New search for: Ueda, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Growth and characterization of Ge nanocrystals in ultrathin SiO~2 films

    New search for: Fukuda, H.
    New search for: Kobayashi, T.
    New search for: Endoh, T.
    New search for: Nomura, S.
    New search for: Sakai, A.
    New search for: Ueda, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Growth and characterization of Ge nanocrystals in ultrathin SiO~2 films

    Contributors:

    Fukuda, H. (author) / Kobayashi, T. (author) / Endoh, T. (author) / Nomura, S. (author) / Sakai, A. (author) / Ueda, Y. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 130-132 ; 776-780

    Publication date:

    1998-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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