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Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy
Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy
Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy
Tanaka, K. (Autor:in) / Sakamoto, T. (Autor:in) / Tohara, M. (Autor:in) / Choo, C.-K. (Autor:in) / Nakata, R. (Autor:in)
APPLIED SURFACE SCIENCE ; 148 ; 215-222
01.01.1999
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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