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    Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy

    New search for: Tanaka, K.
    New search for: Sakamoto, T.
    New search for: Tohara, M.
    New search for: Choo, C.-K.
    New search for: Nakata, R.

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    Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy

    New search for: Tanaka, K.
    New search for: Sakamoto, T.
    New search for: Tohara, M.
    New search for: Choo, C.-K.
    New search for: Nakata, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy

    New search for: Tanaka, K.
    New search for: Sakamoto, T.
    New search for: Tohara, M.
    New search for: Choo, C.-K.
    New search for: Nakata, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Oxygen containing silicon clusters on Teflon and their work functions studied with X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy

    Contributors:

    Tanaka, K. (author) / Sakamoto, T. (author) / Tohara, M. (author) / Choo, C.-K. (author) / Nakata, R. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 148 ; 215-222

    Publication date:

    1999-01-01

    Size:

    8 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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