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Combined substrate polishing and biasing during hot-filament chemical vapor deposition of diamond on copper
Combined substrate polishing and biasing during hot-filament chemical vapor deposition of diamond on copper
Combined substrate polishing and biasing during hot-filament chemical vapor deposition of diamond on copper
Ali, N. (Autor:in) / Ahmed, W. (Autor:in) / Rego, C. A. (Autor:in) / Fan, Q. H. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 15 ; 593-595
01.01.2000
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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