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Pendeo-Epitaxy™ Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition
Pendeo-Epitaxy™ Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition
Pendeo-Epitaxy™ Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition
Gehrke, T. (Autor:in) / Linthicum, K. J. (Autor:in) / Rajagopal, P. (Autor:in) / Preble, E. A. (Autor:in) / Carlson, E. P. (Autor:in) / Robin, B. M. (Autor:in) / Davis, R. F. (Autor:in)
MATERIALS SCIENCE FORUM ; 338/342 ; 1491-1494
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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