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Pendeo-Epitaxy™ Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition
Pendeo-Epitaxy™ Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition
Pendeo-Epitaxy™ Process for Aluminum Gallium Nitride Thin Films on Silicon Carbide Substrates via Metalorganic Chemical Vapor Deposition
Gehrke, T. (author) / Linthicum, K. J. (author) / Rajagopal, P. (author) / Preble, E. A. (author) / Carlson, E. P. (author) / Robin, B. M. (author) / Davis, R. F. (author)
MATERIALS SCIENCE FORUM ; 338/342 ; 1491-1494
2000-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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