Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
XPS analysis of Pb(Zr0.52Ti0.48)O3 thin film after dry-etching by CHF3 plasma
XPS analysis of Pb(Zr0.52Ti0.48)O3 thin film after dry-etching by CHF3 plasma
XPS analysis of Pb(Zr0.52Ti0.48)O3 thin film after dry-etching by CHF3 plasma
Lin, Y. y. (Autor:in) / Liu, Q. (Autor:in) / Tang, T. a. (Autor:in) / Yao, X. (Autor:in)
APPLIED SURFACE SCIENCE ; 165 ; 34-37
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
First principles study of Si etching by CHF3 plasma source
British Library Online Contents | 2011
|British Library Online Contents | 2008
|Prediction of profile surface roughness in CHF3/CF4 plasma using neural network
British Library Online Contents | 2004
|Ultraviolet-assisted cold poling of Pb(Zr0.52Ti0.48)O3 films
British Library Online Contents | 2018
|British Library Online Contents | 2013
|