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Voids in silicon by He implantation: From basic to applications
Voids in silicon by He implantation: From basic to applications
Voids in silicon by He implantation: From basic to applications
Raineri, V. (Autor:in) / Saggio, M. (Autor:in) / Rimini, E. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 15 ; 1449-1477
01.01.2000
29 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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