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The subimplantation model for hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma
The subimplantation model for hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma
The subimplantation model for hydrogenated amorphous carbon films deposited in electron cyclotron resonance plasma
Durand-Drouhin, O. (Autor:in) / Lejeune, M. (Autor:in) / Bouzerar, R. (Autor:in) / Benlahsen, M. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 213-215
01.01.2001
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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