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Investigation of Residual Impurities in 4H-SiC Epitaxial Layers Grown by Hot-Wall Chemical Vapor Deposition
Investigation of Residual Impurities in 4H-SiC Epitaxial Layers Grown by Hot-Wall Chemical Vapor Deposition
Investigation of Residual Impurities in 4H-SiC Epitaxial Layers Grown by Hot-Wall Chemical Vapor Deposition
Nishio, J. (Autor:in) / Kushibe, M. (Autor:in) / Masahara, K. (Autor:in) / Kojima, K. (Autor:in) / Ohno, T. (Autor:in) / Ishida, Y. (Autor:in) / Takahashi, T. (Autor:in) / Suzuki, T. (Autor:in) / Tanaka, T. (Autor:in) / Yoshida, S. (Autor:in)
MATERIALS SCIENCE FORUM ; 389/393 ; 215-218
01.01.2002
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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