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4H-SiC Carbon-Face Epitaxial Layers Grown by Low-Pressure Hot-Wall Chemical Vapor Deposition
4H-SiC Carbon-Face Epitaxial Layers Grown by Low-Pressure Hot-Wall Chemical Vapor Deposition
4H-SiC Carbon-Face Epitaxial Layers Grown by Low-Pressure Hot-Wall Chemical Vapor Deposition
Kojima, K. (Autor:in) / Takahashi, T. (Autor:in) / Ishida, Y. (Autor:in) / Kuroda, S. (Autor:in) / Okumura, H. (Autor:in) / Arai, K. (Autor:in)
MATERIALS SCIENCE FORUM ; 457/460 ; 209-212
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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