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Effects of nitrogen addition on methane-based ECR plasma etching of gallium nitride
Effects of nitrogen addition on methane-based ECR plasma etching of gallium nitride
Effects of nitrogen addition on methane-based ECR plasma etching of gallium nitride
Jin, Z. (Autor:in) / Hashizume, T. (Autor:in) / Hasegawa, H. (Autor:in)
APPLIED SURFACE SCIENCE ; 190 ; 361-365
01.01.2002
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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