Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films: Fid-Bau Portal

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Coullerez, G. / Baborowski, J. / Viornery, C. / Chevolot, Y. / Xanthopoulos, N. / Ledermann, N. / Muralt, P. / Setter, N. / Mathieu, H. J.

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Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Coullerez, G. / Baborowski, J. / Viornery, C. / Chevolot, Y. / Xanthopoulos, N. / Ledermann, N. / Muralt, P. / Setter, N. / Mathieu, H. J.

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Coullerez, G. / Baborowski, J. / Viornery, C. / Chevolot, Y. / Xanthopoulos, N. / Ledermann, N. / Muralt, P. / Setter, N. / Mathieu, H. J.

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Zugriff über TIB

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Bestellung bei Subito €

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Ähnliche Titel

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Titel:

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Beteiligte:

Coullerez, G. (Autor:in) / Baborowski, J. (Autor:in) / Viornery, C. (Autor:in) / Chevolot, Y. (Autor:in) / Xanthopoulos, N. (Autor:in) / Ledermann, N. (Autor:in) / Muralt, P. (Autor:in) / Setter, N. (Autor:in) / Mathieu, H. J. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 203-204 ; 527-531

Erscheinungsdatum:

01.01.2003

Format / Umfang:

5 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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