Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films: Fid-Bau Portal

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Coullerez, G. / Baborowski, J. / Viornery, C. / Chevolot, Y. / Xanthopoulos, N. / Ledermann, N. / Muralt, P. / Setter, N. / Mathieu, H. J.

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Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Coullerez, G. / Baborowski, J. / Viornery, C. / Chevolot, Y. / Xanthopoulos, N. / Ledermann, N. / Muralt, P. / Setter, N. / Mathieu, H. J.

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Coullerez, G. / Baborowski, J. / Viornery, C. / Chevolot, Y. / Xanthopoulos, N. / Ledermann, N. / Muralt, P. / Setter, N. / Mathieu, H. J.

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Document information

Title:

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Contributors:

Coullerez, G. (author) / Baborowski, J. (author) / Viornery, C. (author) / Chevolot, Y. (author) / Xanthopoulos, N. (author) / Ledermann, N. (author) / Muralt, P. (author) / Setter, N. (author) / Mathieu, H. J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 203-204 ; 527-531

Publication date:

2003-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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