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Physical characterization of thin ALD-Al2O3 films
Physical characterization of thin ALD-Al2O3 films
Physical characterization of thin ALD-Al2O3 films
Jakschik, S. (Autor:in) / Schroeder, U. (Autor:in) / Hecht, T. (Autor:in) / Krueger, D. (Autor:in) / Dollinger, G. (Autor:in) / Bergmaier, A. (Autor:in) / Luhmann, C. (Autor:in) / Bartha, J. W. (Autor:in)
APPLIED SURFACE SCIENCE ; 211 ; 352-359
01.01.2003
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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