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Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process

Ali, N. / Kousar, Y. / Fan, Q. H. / Neto, V. F. / Gracio, J.

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Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process

Ali, N. / Kousar, Y. / Fan, Q. H. / Neto, V. F. / Gracio, J.

Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process

Ali, N. / Kousar, Y. / Fan, Q. H. / Neto, V. F. / Gracio, J.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Ähnliche Titel

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Dokumentinformationen

Titel:

Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process

Beteiligte:

Ali, N. (Autor:in) / Kousar, Y. (Autor:in) / Fan, Q. H. (Autor:in) / Neto, V. F. (Autor:in) / Gracio, J. (Autor:in)

Erschienen in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 22 ; 1039-1042

Erscheinungsdatum:

01.01.2003

Format / Umfang:

4 pages

ISSN:

0261-8028

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

Fan, Q. H. / Ali, N. / Kousar, Y. et al. | British Library Online Contents | 2002

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Ooi, H. T. / Ibrahim, K. | British Library Online Contents | 2006

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Point defect incorporation during diamond chemical vapor deposition

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