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Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process
Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process
Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process
Ali, N. (author) / Kousar, Y. (author) / Fan, Q. H. (author) / Neto, V. F. (author) / Gracio, J. (author)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 22 ; 1039-1042
2003-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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