Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Type and charge states of point defects in heavily As- and B-doped silicon
Type and charge states of point defects in heavily As- and B-doped silicon
Type and charge states of point defects in heavily As- and B-doped silicon
Nakabayashi, Y. (Autor:in) / Osman, H. I. (Autor:in) / Yokota, K. (Autor:in) / Toyonaga, K. (Autor:in) / Matsumoto, S. (Autor:in) / Murota, J. (Autor:in) / Wada, K. (Autor:in) / Abe, T. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 6 ; 15-19
01.01.2003
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
An etchant for delineation of flow pattern defects in heavily doped p-type silicon wafers
British Library Online Contents | 2013
|A chromium-free etchant for delineation of defects in heavily doped n-type silicon wafers
British Library Online Contents | 2008
|Delineation of Flow Pattern Defects in Heavily Boron-doped Czochralski Silicon Wafer
British Library Online Contents | 2006
|Minority carrier transport in heavily doped n-type silicon
TIBKAT | 1986
|First-principles study of heavily B-doped silicon
British Library Online Contents | 2008
|