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Volume and grain boundary diffusivity of boron in polycristalline silicon during rapid thermal annealing
Volume and grain boundary diffusivity of boron in polycristalline silicon during rapid thermal annealing
Volume and grain boundary diffusivity of boron in polycristalline silicon during rapid thermal annealing
Merabet, A. (Autor:in) / Gontrand, C. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 102 ; 257-261
01.01.2003
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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