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    Volume and grain boundary diffusivity of boron in polycristalline silicon during rapid thermal annealing

    New search for: Merabet, A.
    New search for: Gontrand, C.

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    Volume and grain boundary diffusivity of boron in polycristalline silicon during rapid thermal annealing

    New search for: Merabet, A.
    New search for: Gontrand, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Volume and grain boundary diffusivity of boron in polycristalline silicon during rapid thermal annealing

    New search for: Merabet, A.
    New search for: Gontrand, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Volume and grain boundary diffusivity of boron in polycristalline silicon during rapid thermal annealing

    Contributors:

    Merabet, A. (author) / Gontrand, C. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 102 ; 257-261

    Publication date:

    2003-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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