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Characterization of Si(111) crystals implanted with Sb+ ions and annealed by rapid thermal processing
Characterization of Si(111) crystals implanted with Sb+ ions and annealed by rapid thermal processing
Characterization of Si(111) crystals implanted with Sb+ ions and annealed by rapid thermal processing
Labbani, R. (Autor:in) / Halimi, R. (Autor:in) / Laoui, T. (Autor:in) / Vantomme, A. (Autor:in) / Pipeleers, B. (Autor:in) / Roebben, G. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 102 ; 390-397
01.01.2003
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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