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Effect of freon flow rate on tin oxide thin films deposited by chemical vapor deposition
Effect of freon flow rate on tin oxide thin films deposited by chemical vapor deposition
Effect of freon flow rate on tin oxide thin films deposited by chemical vapor deposition
Fang, T. H. (Autor:in) / Chang, W. J. (Autor:in)
APPLIED SURFACE SCIENCE ; 220 ; 175-180
01.01.2003
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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