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Formation of interface silicides at room temperature in pulsed laser deposited Ti thin films on Si1 0 0
Formation of interface silicides at room temperature in pulsed laser deposited Ti thin films on Si1 0 0
Formation of interface silicides at room temperature in pulsed laser deposited Ti thin films on Si1 0 0
Venkataraman, V. (Autor:in) / Rajagopalan, S. (Autor:in) / Manoravi, P. (Autor:in) / Balamurugan, A. K. (Autor:in) / Ramalingam, A. (Autor:in) / Tyagi, A. K. (Autor:in)
MATERIALS RESEARCH BULLETIN ; 38 ; 1835-1840
01.01.2003
6 pages
Aufsatz (Zeitschrift)
Englisch
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