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Formation of interface silicides at room temperature in pulsed laser deposited Ti thin films on Si1 0 0
Formation of interface silicides at room temperature in pulsed laser deposited Ti thin films on Si1 0 0
Formation of interface silicides at room temperature in pulsed laser deposited Ti thin films on Si1 0 0
Venkataraman, V. (author) / Rajagopalan, S. (author) / Manoravi, P. (author) / Balamurugan, A. K. (author) / Ramalingam, A. (author) / Tyagi, A. K. (author)
MATERIALS RESEARCH BULLETIN ; 38 ; 1835-1840
2003-01-01
6 pages
Article (Journal)
English
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