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Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides
Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides
Thermal annealing in FHD Ge-doped SiO2 film for applications in optical waveguides
APPLIED SURFACE SCIENCE ; 228 ; 48-52
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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